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Property is sold “as-is” in “as-is” condition. Inspection and verification of any type is the buyers’ responsibility. No warranties, expressed or implied, are provided by realtor or listing agent.The present invention relates to an apparatus for making a semiconductor device.
As high integration of semiconductor devices requires making fine contact holes having a fine width, etching technology using a mask having a line/space pattern formed by a photolithography technique is employed. As this photolithography technique, a chemically amplified resist is widely used which has a large selection ratio with respect to a mask line and a resist thickness distribution of a chip and a high sensitivity. According to this technique, a chemically amplified resist is uniformly deposited on a surface of a wafer with the use of a spin-coating method or a dipping method. A mask line with a line pattern of about 0.5 to 5.mu.m is then formed on the resist. Thereafter, the wafer is exposed to light through the mask, and a photo acid generator (PAG) in the resist is decomposed and a photo acid is produced by the exposure. As a

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We use cookies to ensure that we give you the best experience on our website. If you continue without changing your settings, we will assume that you are happy to receive all cookies from this website. Privacy Policy Continue1. Field of the Invention
The present invention is directed to an apparatus for holding a light source, an apparatus for holding a light source with heat dissipating fins, a projection display device and a method for lighting a light source in a projection display device.
2. Description of Related Art
In a projection display device such as an overhead projector, a tungsten-halogen lamp is used as a light source. The tungsten-halogen lamp is contained in a lamp chamber of the projection display device, and the lamp chamber is closed hermetically. The lamp chamber is heated up to a necessary temperature by a heat exchanger or a metal plate of the lamp chamber.
In the projection display device, when the light source is a tungsten-halogen lamp, the temperature of the surface of the lamp rises to about 1000° C. Therefore, a metal lamp chamber is heated up to about 400° C. to thereby maintain the entire lamp chamber at a temperature not higher than 100° C.
Lamps which are discharge-type lamps such as fluorescent lamps or xenon lamps can be prevented from heat generation. Therefore, in a projection display device equipped with a discharge-type lamp as a light source, the lamp chamber is not heated by a metal plate in the lamp chamber. In the projection display device, the lamp chamber is directly heated by a heat exchanger.
FIG. 8 shows an example of a conventional projection display device. The conventional projection display device is equipped with two light source lamps, and the two light source lamps are disposed at a right angle to each other. One of the light source lamps is a tungsten-halogen lamp as a tungsten-halogen lamp A, and the other of the light source lamps is a discharge-type lamp as a discharge-type lamp B.
In the conventional projection display device, a light source lamp package containing a light source lamp (a sealed glass lamp, a sealed quartz lamp, an arc lamp, an electron lamp or the like), a lamp housing and a reflector is disposed in a lamp chamber 10 of the projection display device (see FIG. 8). A pair of concave reflectors 11, 12 are disposed at a right angle to each other in the lamp chamber 10